Olaf Bolkenbaas

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Area-Selective Atomic Layer Deposition through Fluorination of SiO₂ with a SF₆-H₂ plasma

Eden Goodwin

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Area Selective Deposition of Redox-Active N-Heterocyclic Carbenes

Hae Lin Yang

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Investigating Small Molecular Inhibitors with Aromatic Rings for AS-ALD of MoO₂: Understanding the Chemical and Physical Passivating Abilities


Majeda Al Hareri

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Precursor Reactivity Development for Main Group Element Thermal ALD